1

The K3[Fe(CN)6]—KOHH2O photoetchant for InP

Year:
1988
Language:
english
File:
PDF, 255 KB
english, 1988
7

Study of Niobium Nitride Films Produced by DC Reactive Magnetron Sputtering

Year:
1997
Language:
english
File:
PDF, 280 KB
english, 1997
9

Revealing of defects in {110} InP

Year:
1993
Language:
english
File:
PDF, 525 KB
english, 1993
22

Characterisation of titanium disilicide thin films

Year:
2006
Language:
english
File:
PDF, 961 KB
english, 2006
27

RF diode reactive sputtering of n- and p-type zinc oxide thin films

Year:
2007
Language:
english
File:
PDF, 205 KB
english, 2007
29

Thermal stability of NbN films deposited on GaAs substrates

Year:
1998
Language:
english
File:
PDF, 388 KB
english, 1998
33

Chemical bevelling of GaAs-based structures

Year:
1997
Language:
english
File:
PDF, 174 KB
english, 1997
34

Chemical bevelling of CdTe and CdTe/MnTe structures

Year:
1998
Language:
english
File:
PDF, 413 KB
english, 1998
38

Effects of thermal annealing on the properties of niobium nitride thin films

Year:
1994
Language:
english
File:
PDF, 568 KB
english, 1994
40

Observation of dislocation etch pits on (001) InGaAsP (λ= 1.3µm)

Year:
1987
Language:
english
File:
PDF, 1.09 MB
english, 1987
41

A method for diffusion coefficient determination of phosphorus in liquid indium

Year:
1979
Language:
english
File:
PDF, 282 KB
english, 1979
42

Chemical bevelling of InP-based structures by HBrH3PO4K2Cr2O7 solution

Year:
1997
Language:
english
File:
PDF, 563 KB
english, 1997